Time: Thursday, October 11th, 11:00 a.m. & Friday, October 12th, 10:00 a.m.
Location: Aggarwal Lecture Hall, Room 130
Polymer Engineering Academic Center
250 South Forge Street, Akron, OH 44325-0301
Lectures Are Free And Open To The Public
During the last half century, scientists and engineers have devised methods and materials that have enabled manufacturing of the incredibly small and ever shrinking structures that are the basis of the microelectronics industry. Today several companies are making many millions of devices every day that have structures smaller than a virus. This is "nanotechnology" in its purest form and it has required fundamental advances in many areas including optics, materials chemistry and process technology. The ability to manufacture such incredibly small structures and the devices derived from them is a tribute to the ingenuity of man; an accomplishment that has changed society in remarkable ways. The driving force for the nearly frantic efforts to to make ever smaller structures derives from the fact that doing so makes the products both more functional and cheaper. We will discuss the history of this manufacturing process, assess some of the important issues that limit continued shrinkage of the devices and look at the future and the opportunities in this fascinating and important technology area.
There is a continuing and frantic effort on the part of the microelectronics manufacturers to make smaller and smaller devices. Companies that cannot keep pace with these advances quickly disappear from the market place and sadly many with famous names like Siemens, Motorola and Sony have fallen by the wayside. Photolithography, the process that has enabled the production of all of today’s microelectronic devices has now reached physical limits. Efforts to push that technology to provide still higher resolution by the historical paths of wave length reduction, increase in numerical aperture and reduction in the Raleigh constant have been abandoned. Is this the end? Can scaling continue??
Various incredibly clever tricks based on relatively simple chemical principles have been devised that extend the resolution limits of photolithography, some of which are already in use in full scale manufacturing. Unfortunately, these tricks add complexity to the patterning process and carry an associated increase in cost. The high cost of these clever, but complex processes and the even higher cost of the alternatives threatens to change the economics of the semiconductor manufacturing industry. We will review some of these resolution extension tricks including recent advances in organic materials for directed self-assembly of block co-polymers and a new technique that doubles the resolution of the projection printing process by controlling the kinetics of some key photochemical steps, but requires no extra processing steps. There are many challenges and many opportunities in this field for chemists, polymer scientists and process engineers.
Dr. Grant Willson joined the faculties of the Departments of Chemical Engineering and Chemistry at The University of Texas at Austin in 1993 where he holds the Rashid Engineering Regent’s Chair. He received his B.S. and Ph.D. in organic chemistry from the University of California, Berkeley, and an M.S. degree in Organic Chemistry from San Diego State University. He came to the University of Texas from his position as an IBM Fellow and Manager of the Polymer Science and Technology area at the IBM Almaden Research Center in San Jose, California. He joined IBM after serving on the faculties of California State University, Long Beach and the University of California, San Diego. Willson is a member of the ACS, AIChE, APS, SPIE, ASEE, SPE and Sigma Xi and is a member of the National Academy of Engineering. He is an associate editor of ACS NANO and serves on the advisory board for several journals in materials science. He is the co-author of more than 400 journal publications, editor and author of several books and co-inventor on more than 40 issued patents. He also is a co-founder of Molecular Imprints, Inc. in Austin Texas.
Willson's research can be characterized as the design and synthesis of functional organic materials with more recent emphasis on materials that undergo specific interactions with radiation. These include monomeric and polymeric liquid crystalline materials, polymeric non-linear optical materials, novel photoresist materials, etc. His work has been recognized by the Gordon E. Moore Medal from the Electro-Chemical Society, the SEMI North America Award, the SPIE Frits Zernike Award, the Arthur Doolittle,the Chemistry of Materials, Applied Polymer Science, the Heroes in Chemistry, Cooperative Research and the Carothers Awards from the American Chemical Society and the Alexander von Humboldt Senior Scientist Award from the Federal Republic of Germany. He also received the SRC Technical Excellence Award, the SRC Aristotle Award, the Malcolm E. Pruitt Award The Kosar Award, the Zernike Award and other honors. He was the recipient of the National Academy of Sciences Award for Chemistry in Service to Society. He was elected a Fellow of IBM, SPIE and MRS and was an inaugural Fellow of the ACS. President George W. Bush presented him with the 2007 National Medal of Technology and Innovation.