Nanoimprint Lithography

Capabilities

  • Flexible and cost efficient lithography
  • Nanopattern replication of surfaces down to 10 nm for surface functionalization
  • Thermal or UV NIL with controlled wetting
  • Hot embossing
  • Simultaneous Thermal and UV (STU®) imprint process
  • Uses the patented Soft Press® technology
  • Uniform heating and a wide range of temperature settings
  • Use of wide range of imprint polymer